Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports
Reexamination Certificate
2002-02-27
2003-06-03
Lee, John R. (Department: 2881)
Radiant energy
Inspection of solids or liquids by charged particles
Analyte supports
C250S492200, C250S492300, C250S307000, C250S310000
Reexamination Certificate
active
06573511
ABSTRACT:
BACKGROUND OF THE INVENTION
The present invention relates to an electron beam irradiation system and an electron beam irradiation method, which are used, for example, for recording on a master of optical disks.
In recent years, there has been a demand for a higher recording density on optical disks, and, for realizing this, it is necessary to form recording pits more finely.
Therefore, in the manufacture of a master of optical disks, there has been proposed a system of recording by irradiation with an electron beam, with which finer pits can be formed than with a conventional laser light.
In the system of recording by irradiating the master with the electron beam, it is necessary to accurately focus the electron beam on the master for enabling high-precision recording.
Hitherto, as an electron beam irradiation system comprising a means for focusing an electron beam, there has been known the system shown in FIG.
1
.
Namely, in this system, a reversing table
41
is provided in a vacuum vessel
40
so that it can be rotated by a reversing mechanism
42
, a motor
43
is fixed on one end side of the reversing table
41
, a master
45
is mounted on a turn-table
44
fitted to a rotary shaft of the motor
43
, and the master
45
is irradiated with an electron beam emitted from an electron beam irradiation means
46
to achieve recording.
In this system, a focusing stage
47
for focusing the electron beam is provided on the other end side of the reversing table
41
, namely, at an end portion on the opposite side of the turn-table
44
with respect to the center of rotation of the reversing table
41
.
The focusing stage
47
has its upper surface set at the same height with the master
45
mounted on the turn-table
44
. At the time of recording on the master
45
, first, the focusing stage
47
is made to correspond to the electron beam irradiation means
46
, and, in this condition, the upper surface of the focusing stage
47
is irradiated with the electron beam, and focusing of the electron beam is conducted by the electron beam irradiation means
46
. Thereafter, the reversing table
41
is rotated 180° (reversed) by the reversing mechanism
42
so that the master
45
corresponds to the electron beam irradiation means
46
, and the master
45
is irradiated with the electron beam to perform recording.
However, the conventional electron beam irradiation system constituted as above has the following problems.
Namely, the conventional system has a construction such that the master and the focusing stage are moved by reversing, so that the distance between the master and the focusing stage is large, and it is difficult to maintain both of them at the same height accurately.
Therefore, with the conventional system, it is difficult to accurately focus the electron beam on the master, and there is a question as to realization of high-precision recording.
SUMMARY OF THE INVENTION
The present invention has been made to solve the above-mentioned problems of the related art. Accordingly, it is an object of the present invention to make it possible to focus an electron beam on a body to be irradiated, for example, a master of optical disks, easily and accurately, and to enable high-precision recording on the master.
In order to attain the above object, the present invention provides an electron beam irradiation system including:
a support mechanism portion having a slide table for supporting a master (a body to be irradiated) to be irradiated with an electron beam so that the master can be rotated and moved in a radial direction, and
an electron beam irradiation means for irradiating the master with the electron beam while partially establishing a vacuum condition on the master, wherein
a focusing stage for focusing the electron beam is stationarily disposed on the slide table of the support mechanism portion at a position adjacent to the master.
In the electron beam irradiation system, focusing of the electron beam is conducted by irradiating the focusing stage with the electron beam before performing recording on the master. Thereafter, the slide table is moved to an electron beam irradiation starting position for the master, and recording is conducted by irradiating the master with the electron beam.
In the electron beam irradiation system according to the present invention, the distance between the master and the focusing stage is short, which is advantageous in view of precision in adjusting the height of the focusing stage to the height of the master. Therefore, it is possible to accurately focus the electron beam on the master and to achieve high-precision recording.
As described above, according to the present invention, the electron beam irradiation system of a partial vacuum system in which only the portion for irradiation with the electron beam is in a vacuum can easily and accurately perform focusing of the electron beam to the body to be irradiated by disposing a focusing stage at a position adjacent to the body to be irradiated on the slide table for supporting the body to be irradiated. Consequently, where the body to be irradiated is a master optical disk, the electron beam irradiation system can perform high-precision recording.
The above and other objects, features and advantages of the present invention will become apparent from the following description and appended claims, taken in conjunction with the accompanying drawings, which show by way of example some preferred embodiments of the invention.
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Aki Yuichi
Miura Yoshihisa
Sasaki Jun
Kananen Ronald P.
Lee John R.
Rader & Fishman & Grauer, PLLC
Sony Corporation
Souw Bernard E.
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