Radiant energy – Fluent material containment – support or transfer means
Reexamination Certificate
2008-02-07
2009-08-04
Vanore, David A. (Department: 2881)
Radiant energy
Fluent material containment, support or transfer means
C250S306000, C250S310000, C250S397000
Reexamination Certificate
active
07569838
ABSTRACT:
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.
REFERENCES:
patent: 4912052 (1990-03-01), Miyoshi et al.
patent: 5030908 (1991-07-01), Miyoshi et al.
patent: 5315119 (1994-05-01), Komatsu et al.
patent: 5359197 (1994-10-01), Komatsu et al.
patent: 5362968 (1994-11-01), Miyoshi et al.
patent: 5363968 (1994-11-01), Soloman
patent: 5479535 (1995-12-01), Komatsu
patent: 5892224 (1999-04-01), Nakasuji
patent: 6038018 (2000-03-01), Yamazaki et al.
patent: 6184526 (2001-02-01), Kohama et al.
patent: 6365897 (2002-04-01), Hamashima et al.
patent: 6388261 (2002-05-01), Nakasuji
patent: 6555815 (2003-04-01), Feuerbaum et al.
patent: 6670602 (2003-12-01), Kohama et al.
patent: 6683320 (2004-01-01), Gerlach et al.
patent: 09-311112 (1997-12-01), None
patent: 10-12684 (1998-01-01), None
patent: 10-255709 (1998-09-01), None
patent: 10-284394 (1998-10-01), None
patent: 11-242943 (1999-09-01), None
patent: 11-345585 (1999-12-01), None
patent: 2000-100364 (2000-04-01), None
patent: 2000-100369 (2000-04-01), None
patent: 2000-113848 (2000-04-01), None
patent: 2000-356512 (2000-12-01), None
patent: WO 99/50651 (1999-10-01), None
Japanese Office Action dated Jan. 4, 2005.
“LSI Testing Symposium/1996; Meeting Minutes” (Nov. 7-8, 1996).
Hatakeyama Masahiro
Karimata Tsutomu
Murakami Takeshi
Nagahama Ichirota
Nagai Takamitsu
Ebara Corporation
Kabushiki Kaisha Toshiba
Vanore David A.
Westerman, Hattori, Daniels & Adrian , LLP.
LandOfFree
Electron beam inspection system and inspection method and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electron beam inspection system and inspection method and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam inspection system and inspection method and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4057576