Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type
Patent
1997-03-26
1999-11-16
Anderson, Bruce C.
Radiant energy
Inspection of solids or liquids by charged particles
Electron probe type
250307, H01J 3728
Patent
active
059862637
ABSTRACT:
An electron beam inspection method and apparatus. The method includes controlling acceleration voltage of electron beam and electric field on a sample, beam current, beam diameter, image detection rate, image dimensions, precharge, discharge, or a combination of them, exposing an object to the electron beam, detecting in a sensor a physical change generated from the object, and inspecting or measuring the object on the basis of a signal representing the detected physical change. The apparatus includes an electron source (potential E2) for generating an electron beam, a deflector for scanning generated electrons, an objective lens for focusing the electron beam upon the object, a grid (potential E1) disposed between the object and the objective lens, a wafer holder (potential E0) for holding the object, a sensor for detecting generated secondary electrons, a potential controller for controlling the potential E0, E1 and E2, and a storage for storing optimum potential conditions. By changing conditions of an electron optic system such as potential E0, E1 and E2, the acceleration voltage and electric field on the object are controlled. For a material located at least in an upper layer of a plurality of materials forming the object, the secondary electron yield ratio can be made nearly unity and appropriate contrast of an obtained image can be provided with minimized influence of charge up.
REFERENCES:
patent: 2467224 (1949-04-01), Picard
patent: 3219817 (1965-11-01), Mollenstedt
patent: 4443278 (1984-04-01), Zingher
patent: 4453086 (1984-06-01), Grobman
patent: 4675530 (1987-06-01), Rose et al.
patent: 4933565 (1990-06-01), Yamaguchi et al.
patent: 4939360 (1990-07-01), Sakai
patent: 5401973 (1995-03-01), McKeown et al.
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 5578821 (1996-11-01), Meisberger et al.
patent: 5670782 (1997-09-01), Sato
Hiroi Takashi
Kuni Asahiro
Matsuyama Yukio
Nozoe Mari
Shinada Hiroyuki
Anderson Bruce C.
Hitachi , Ltd.
LandOfFree
Electron beam inspection method and apparatus and semiconductor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electron beam inspection method and apparatus and semiconductor , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam inspection method and apparatus and semiconductor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1327633