Electron-beam focusing apparatus and electron-beam...

Details Electron-beam focusing apparatus and electron-beam... Electron-beam focusing apparatus and electron-beam...

2005-03-22

2005-03-22

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200

Reexamination Certificate

active

06870173

ABSTRACT:
An electron-beam focusing apparatus for controlling a path of electron beams emitted from an electron-beam emitter in an electron-beam projection lithography (EPL) system includes top and bottom magnets for creating a magnetic field within a vacuum chamber, the top and bottom magnets disposed above and below the vacuum chamber into which a wafer is loaded, respectively; upper and lower pole pieces magnetically contacting the top and bottom magnets, respectively, the upper and lower pole pieces penetrating a top wall and a bottom wall of the vacuum chamber, respectively; and upper and lower projections having a circular shape, extending outwardly from facing surfaces of the upper and lower pole pieces, respectively.

REFERENCES:
patent: 4705956 (1987-11-01), Ward

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