Electron beam exposure system

Details Electron beam exposure system Electron beam exposure system

1981-09-17

1983-10-18

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

2504922, 219121E, H01J 3700, G21K 510

Patent

active

044108001

ABSTRACT:
In an electron beam exposure system, a table on which a target was mounted is accelerated in Y direction and then decelerated. During this movement, the speed of the target is detected. An electron beam which is directed to the target is deflected in X direction at a constant deflection rate by X deflection electrodes. The electron beam which passed through the gap between the X deflection electrodes is deflected by Y deflection electrodes at a deflection rate and from a deflection starting point in Y direction during the period of acceleration and deceleration. The electron beam then lands on the target. The deflection rate and the deflection starting point are determined by the moving speed of the table so as to draw on the table a straight line extending in the X direction. Thus, the target is exposed at high speed with high accuracy.

REFERENCES:
patent: 3900737 (1975-03-01), Collier et al.
patent: 4063103 (1977-12-01), Sumi
patent: 4147937 (1979-04-01), Buelow et al.

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