Electron beam exposure system

Radiant energy – Radiant energy generation and sources – Plural radiation sources

Reexamination Certificate

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Details

C250S492220, C250S492300, C250S306000, C250S398000, C250S3960ML

Reexamination Certificate

active

07091504

ABSTRACT:
The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising:a beamlet generator for generating a plurality of electron beamlets;a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet;a controller, connected to the modulation array for individually controlling the modulators,an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator;a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, anda target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

REFERENCES:
patent: 5969362 (1999-10-01), Kawata et al.
patent: 6014200 (2000-01-01), Sogard et al.
patent: 6897458 (2005-05-01), Wieland et al.
patent: 2003/0132382 (2003-07-01), Sogard
patent: 2003/0155522 (2003-08-01), Ooae et al.
patent: 1300870 (2003-04-01), None
patent: 2340991 (2000-03-01), None
patent: 2002110527 (2002-04-01), None
patent: WO 02/41372 (2002-05-01), None
patent: WO 02/43102 (2002-05-01), None
“Microstructures for Particle Beam Control”, G.W., Journal of Vacuum Science and Tech., Nov. 1, 1999, pp. 2023-2027, XP000001001.

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