Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1983-06-09

1986-04-29

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250396ML, H01J 3700

Patent

active

045859434

ABSTRACT:
An electron beam exposure apparatus having a control apparatus wherein the positioning error caused by transient response characteristics of an electron beam deflection device is detected by using a knife-edge type gauge and a reflecting electron detector. A compensation signal to compensate for the positioning error is produced in a compensation device, and the compensation signal is applied to the electron beam deflection device, whereby the deviation of the position of the electron beam, from the normal position, caused by the transient response characteristics, is reduced.

REFERENCES:
patent: 4125772 (1978-11-01), Holmes
patent: 4362942 (1982-12-01), Yasuda

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