Electron-beam excited plasma generator with side orifices in the

Details Electron-beam excited plasma generator with side orifices in the Electron-beam excited plasma generator with side orifices in the

1998-06-04

1999-08-24

Lee, Benny

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511171, 118723HC, 31323131, H01J 2702, H05H 124

Patent

active

059428546

ABSTRACT:
The present invention provides an electron-beam excited plasma generator which can effectively form samples of larger areas.
The electron-beam excited plasma generator according to the present invention comprises a cathode (11) for emitting thermions; a discharge electrode (23) for gas discharge between the cathode and the same; an intermediate electrode (13) positioned coaxially with the discharge electrode in an axial direction; a discharge chamber (2) to be filled with discharge gas plasma generated by the gas discharge between the cathode and the discharge electrode; a plasma processing chamber (3) formed adjacent to the discharge chamber with a partition wall (21) disposed therebetween and positioned so that a surface-to-be-processed of a workpiece-to-be-processed (35) is positioned perpendicular to the axial direction; a plurality of orifices (22) for pulling out electrons in the discharge gas plasma in the discharge chamber into the plasma processing chamber, each being formed in the partition wall substantially perpendicular to the axial line and distributed radially with respect to the axial direction; and an accelerating electrode (31) disposed in the plasma processing chamber for pulling out and accelerating the electrons through the orifices.

REFERENCES:
patent: 5097179 (1992-03-01), Takayama
patent: 5384018 (1995-01-01), Ramm et al.

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