Electron beam-excited ion beam source

Details Electron beam-excited ion beam source Electron beam-excited ion beam source

1986-05-28

1988-06-07

Chatmon, Saxfield

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

250423R, 31323131, 3133621, 31511191, 31511131, 31511141, H01J 724, H05B 3126

Patent

active

047499109

ABSTRACT:
An electron beam-excited ion beam source having a plasma region, an accelerating cathode, an electron beam accelerating region, an accelerating anode, an ion producing region and a target cathode in this order, and further comprising means for applying a negative electric potential to the target cathode as against the accelerating cathode and an ion extracting electrode for extracting positive ions or negative ions produced in the ion producing region whereby a high current ion beam can be obtained in a low input power.

REFERENCES:
patent: 3270243 (1966-08-01), Kerst
patent: 3315125 (1967-04-01), Frohlich
patent: 4085376 (1978-04-01), Abramyan et al.
patent: 4339691 (1982-07-01), Morimiya et al.
patent: 4388560 (1983-06-01), Robinson et al.
patent: 4422013 (1983-12-01), Turchi et al.
patent: 4574179 (1986-03-01), Masuzawa et al.
"Research Report" of the Institute of Plasma Physics, Nagoya University, Joshin Uramoto, May 1979.

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