Electron beam excitation ion source

Details Electron beam excitation ion source Electron beam excitation ion source

1990-02-28

1991-07-02

Berman, Jack I.

Radiant energy

Ion generation

Electron bombardment type

31511181, 313230, 3133621, H01J 304

Patent

active

050287915

ABSTRACT:
An electron beam excitation ion source comprises a housing having an ion generation chamber therein. A discharge gas and an accelerated electrons are introduced into the ion generation chamber, causing the accelerated electrons to collide against the discharge gas to generate a plasma containing ions in the ion generation chamber. The housing includes an ion extraction port through which the ions are extracted from the ion generation chamber outside the housing and an electron reflecting member exposed in the ion generation chamber to reflect the electrons.

REFERENCES:
patent: 4468564 (1984-08-01), Boyer et al.
patent: 4649278 (1987-03-01), Chutjian et al.
patent: 4933551 (1990-06-01), Bernius et al.

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