Electron beam drawing apparatus

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S492230

Reexamination Certificate

active

07045800

ABSTRACT:
To provide an electron beam drawing apparatus capable of drawing the grating pitch of a fine diffraction grating pattern highly precisely.An objective lens is constructed of lenses of two stages, and an object deflector is disposed over the objective lens of the lower stage. The power of the objective lens of the lower stage is changed to change the deflection width of the object deflector, and the power of the objective lens of the upper stage is changed to form the image on a sample plane thereby to make a focusing.

REFERENCES:
patent: 5831273 (1998-11-01), Someda et al.
patent: 6171760 (2001-01-01), Yamazaki et al.
patent: 6495841 (2002-12-01), Ando et al.
patent: 51-13991 (1976-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electron beam drawing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam drawing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam drawing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3645305

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.