Electron beam depicting method, mother die manufacturing...

Details Electron beam depicting method, mother die manufacturing... Electron beam depicting method, mother die manufacturing...

2007-12-25

2007-12-25

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S3960ML

Reexamination Certificate

active

10796885

ABSTRACT:
There is described a method for depicting a predetermined pattern, such as a diffraction pattern employed in an optical element, on a substrate. The method includes the steps of: acquiring shape data of the predetermined pattern; generating a first input signal for deflecting an electron beam emitted from an electron gun in a main-scanning direction, and a second input signal for deflecting the electron beam in a sub-scanning direction, based on the shape data of the predetermined pattern; adjusting an alternating bias signal, having a specific frequency, according to the shape data of the predetermined pattern; superposing the alternating bias signal on the second input signal; and deflecting the electron beam emitted from the electron gun in the sub-scanning direction according to the second input signal on which the alternating bias signal is superposed, while scanning the electron beam by deflecting it in a main-scanning direction.

REFERENCES:
patent: 2004/0173921 (2004-09-01), Furuta et al.
patent: 2002-333722 (2002-11-01), None

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