Electron beam control assembly for a scanning electron beam comp

Details Electron beam control assembly for a scanning electron beam comp Electron beam control assembly for a scanning electron beam comp

1984-04-16

1986-11-25

Moore, David K.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

313424, 313426, 313445, H01J 2984

Patent

active

046251502

ABSTRACT:
An improved ion clearing electrode assembly for use in an electron beam production and control assembly which is especially suitable for use in a scanning electron beam computed tomography X-ray scanning system. The assembly uses a vacuum sealed housing chamber which is evacuated of internal gases and in which the electron beam is generated and propagated. Normally residual gas within the chamber interacts with the electrons of the beam to produce positive ions which have the affect of neutralizing the space charge of the electron beam and thereby causing focusing difficulties and destabilization of the beam. The ion collecting electrodes herein are an improvement of those disclosed in the co-pending Rand U.S. patent application Ser. No. 434,252, now U.S. Pat. No. 4,521,900. The electrodes are designed to extract the ions and reduce their neutralizing effect while maintaining a precisely uniform electric field and therefore beam optical aberrations are minimized. In addition, the electrode provides flexibility in the variation of parameters which effect ion extraction and the neutralization fraction.

REFERENCES:
patent: 2921212 (1960-01-01), Berthold
patent: 4075533 (1978-02-01), Janko
patent: 4155028 (1979-05-01), Stolte

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