Electron beam column for writing shaped electron beams

Details Electron beam column for writing shaped electron beams Electron beam column for writing shaped electron beams

2008-09-23

2008-09-23

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S398000, C250S492200, C250S3960ML, C313S542000, C313S530000, C313S531000, C313S539000, C313S541000, C313S544000, C313S311000, C313S34600R, C313S351000, C313S309000

Reexamination Certificate

active

11243363

ABSTRACT:
An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.

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