Electron beam apparatus with aberration corrector

Details Electron beam apparatus with aberration corrector Electron beam apparatus with aberration corrector

2008-05-20

2008-05-20

Wells, Nikita (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

C250S310000, C250S311000, C250S3960ML, C250S3960ML, C250S492200

Reexamination Certificate

active

11655946

ABSTRACT:
An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

REFERENCES:
patent: 3952198 (1976-04-01), Harada et al.
patent: 6252412 (2001-06-01), Talbot et al.
patent: 6723997 (2004-04-01), Matsuya et al.
patent: 6982427 (2006-01-01), Kawasaki et al.
patent: 7199365 (2007-04-01), Kawasaki et al.
patent: 2003/0098415 (2003-05-01), Matsuya et al.
patent: 2005/0104006 (2005-05-01), Yoshida et al.
patent: 2006/0033037 (2006-02-01), Kawasaki et al.
patent: 2000-195453 (1998-12-01), None
Begründet von Fritz Gössler et al., “Properties of Spherically Corrected Achromatic Electron-Lenses”, with English abstract, Optik 33 (1971), pp. 1-24.
J. Zach, “Design of a High-Resolution Low-Voltage Scanning Electron Microscope”, Optik 83 (1989), pp. 30-40.
Joachim Zach and Maximilian Haider, “Aberration Correction in a Low Voltage SEM by a Multipole Corrector”, Nuclear Instruments and Methods on Physics Research , A 363 (1995), pp. 316-325.

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