Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type
Reexamination Certificate
2006-08-22
2006-08-22
Lee, John R. (Department: 2881)
Radiant energy
Inspection of solids or liquids by charged particles
Electron probe type
Reexamination Certificate
active
07095022
ABSTRACT:
The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
REFERENCES:
patent: 4607167 (1986-08-01), Petric
patent: 4912052 (1990-03-01), Miyoshi et al.
patent: 5001349 (1991-03-01), van der Mast
patent: 5359197 (1994-10-01), Komatsu et al.
patent: 5513002 (1996-04-01), Shapanus et al.
patent: 5557105 (1996-09-01), Honjo et al.
patent: 5628828 (1997-05-01), Kawamura
patent: 5685684 (1997-11-01), Kato et al.
patent: 5892224 (1999-04-01), Nakasuji
patent: 5981947 (1999-11-01), Nakasuji et al.
patent: 6087667 (2000-07-01), Nakasuji et al.
patent: 6125522 (2000-10-01), Nakasuji
patent: 6287004 (2001-09-01), Sogard
patent: 6476396 (2002-11-01), Forsyth
patent: 6518582 (2003-02-01), Kohama
patent: 2001/0052577 (2001-12-01), Yuichi et al.
Sandland et al: “An electron-beam inspection system for x-ray mask production”,J. of Vacuum Sci.&Tech. B(1991) vol. 9, No. 6; pp. 3005-3009.
Meisburger et al: “Requirements and performance of an electron-beam column deisgned for x-ray mask inspection”;J. of Vacuum Sci.&Tech. B: (1991) vol. 9, No. 6; pp. 3010-3014.
Lischke et al: “Multi-beam Concepts for Nanometer Devices”;JP J. Applied Physics(1989) vol. 28, pp. 2058-2064.
Electron/Ion Beam Handbook 2nd: Nikkan Kogyo (1989) pp. 115-119 (with partial English translation).
U.S. Appl. No. 09/985,323; filed Nov. 2, 2001: Mamoru Nakasuji et al.; “Electron Beam Apparatus and Device Production Method Using the Electron Beam Apparatus”.
U.S. Appl. No. 09/985,324; filed Nov. 2, 2001; Toshifumi Kimba et al.; “Apparatus for Inspecting Material with Electron Beam, Method for Operating Same, and Method for Manufacturing Semiconductor Device Using Former”.
U.S. Appl. No. 09/985,325; filed Nov. 2, 2001; Mamoru Nakasuji et al.; “Electron Beam Apparatus and Method of Manufacturing Semiconductor Device Using the Apparatus”.
U.S. Appl. No. 09/985,331; filed Nov. 2, 2001; Mamoru Nakasuji et al. “Method for Inspecting Substrate, Substrate Inspecting System and Electron Beam Apparatus”.
Hamashima Muneki
Hatakeyama Masahiro
Karimata Tsutomu
Kato Takao
Kimba Toshifumi
Ebara Corporation
Johnston Phillip
Lee John R.
Nikon Corporation
Westerman Hattori Daniels & Adrian LLP
LandOfFree
Electron beam apparatus and method of manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electron beam apparatus and method of manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam apparatus and method of manufacturing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3646691