Electron beam apparatus and device manufacturing method...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S306000, C250S307000, C250S397000

Reexamination Certificate

active

07098457

ABSTRACT:
A defect inspecting apparatus is provided for generating a less distorted test image to reliably observe a surface of a sample for detecting defects thereon. The defect detecting apparatus comprises a primary electron beam source for irradiating a sample, electrostatic lenses for focusing secondary electrons emitted from the surface of the sample irradiated with the primary electron beam, a detector for detecting the secondary electrons, and an image processing unit for processing a signal from the detector. Further, a second electron source may be provided for emitting an electron beam irradiated to the sample, wherein the sample may be irradiated with the electron beam from the second electron source before it is irradiated with the primary electron beam from the first electron source for observing the sample. A device manufacturing method is also provided for inspecting devices under processing with high throughput using the defect detecting apparatus.

REFERENCES:
patent: 4851768 (1989-07-01), Yoshizawa et al.
patent: 4902967 (1990-02-01), Flesner
patent: 5576833 (1996-11-01), Miyoshi et al.
patent: 6184526 (2001-02-01), Kohama et al.
patent: 6265719 (2001-07-01), Yamazaki et al.
patent: 6333510 (2001-12-01), Watanabe et al.
patent: 6476387 (2002-11-01), Nishimura et al.
patent: 6498345 (2002-12-01), Weimer et al.
patent: 6509564 (2003-01-01), Suzuki et al.
patent: 6700122 (2004-03-01), Matsui et al.
patent: 6765217 (2004-07-01), Nishimura et al.
patent: 2002/0148975 (2002-10-01), Kimba et al.
patent: 2003/0025076 (2003-02-01), Takagi et al.
patent: 2003/0094572 (2003-05-01), Matsui et al.
patent: 02-099847 (1990-04-01), None
patent: 07-014537 (1995-01-01), None
patent: 07-249393 (1995-09-01), None
patent: 11-132975 (1999-05-01), None
patent: 2001-272363 (2001-10-01), None
patent: 2002-216698 (2002-08-01), None
Electron beam inspection system based on the projection imaging electron microscope, J. Vac. Sci. Technol. B, 19(6), Nov./Dec. 2001, p. 2852-2855.
Material for the 145th Study Meeting of Japan Society for the Promotion of Science, pp. 18-23 and 28-30 (translation provided in parent application).
Electronic Microscope, vol. 36, No. 1, 2001, p. 53-56 (translation provided in parent application).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electron beam apparatus and device manufacturing method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam apparatus and device manufacturing method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam apparatus and device manufacturing method... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3684158

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.