Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Reexamination Certificate
2011-01-04
2011-01-04
Vanore, David A (Department: 2881)
Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
C250S305000, C250S307000, C250S310000, C250S311000, C250S3960ML
Reexamination Certificate
active
07863580
ABSTRACT:
An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample and secondary electrons emanating from the sample are formed into an image on a detector by an image projection optical system. An electron gun61has a cathode1and a drawing electrode3, and an electron emission surface1aof the cathode defines a concave surface. The drawing electrode3has a convex surface3acomposed of a partial outer surface of a second sphere facing the electron emission surface1aof the cathode and an aperture73formed through the convex surface for passage of the electrons. An aberration correction optical apparatus comprises two identically sized multi-polar Wien filters arranged such that their centers are in alignment with a ¼ plane position and a ¾ plane position, respectively, along an object plane-image plane segment in the aberration correction optical apparatus, and optical elements having bidirectional focus disposed in an object plane position, an intermediate image-formation plane position and an image plane position, respectively, in the aberration correction optical apparatus.
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Hatakeyama Masahiro
Karimata Tsutomu
Mori Satoshi
Murakami Takeshi
Nagahama Ichirota
Ebara Corporation
Kabushiki Kaisha Toshiba
Vanore David A
Westerman Hattori Daniels & Adrian LLP
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