Electron beam apparatus, a device manufacturing method using...

Details Electron beam apparatus, a device manufacturing method using... Electron beam apparatus, a device manufacturing method using...

2005-02-16

2008-09-16

Vanore, David A. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C313S455000

Reexamination Certificate

active

07425703

ABSTRACT:
An object of the present invention is to provide an electron beam apparatus, in which a plurality of electron beams, e.g., four electron beams, is produced for one optical axis with a relatively high current achieved for each electron beam.Provided is an electron beam apparatus comprising: an electron beam emitter (32) having an electron gun (30), said electron gun (30) disposed along an optical axis (23) and operable to emit a plurality of off-axis electron beams along a direction defined by a certain angle with respect to the optical axis (23); a plurality of apertures (34) disposed at a location offset from the optical axis (23); and an electromagnetic lens (7) for forming a magnetic field between the electron gun (30) and the apertures (34) to control the plurality of off-axis electron beams emitted from the electron gun (30) so that the plurality of off-axis electron beams passes through the apertures (34).

REFERENCES:
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patent: 63-17523 (1988-01-01), None
patent: 7-249393 (1995-09-01), None
Y. Kumashiro et al.,Electron-Emission Characteristics and Surface States of Carbides Emitters—TiC Single Crystal and Other Transition Metal Carbides-, Journal Applied Physics, vol. 45, No. 7, 1976, pp. 607-614.
Dr. Jayant Neogi, et al. “Next generation Electron Beam mask repair tool”, Collection of Abstracts, NGL 2003, Jul. 10-11, 2003, pp. 129-130.

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