Radiant energy – Inspection of solids or liquids by charged particles – Electron microscope type
Reexamination Certificate
2006-07-24
2011-11-29
Maskell, Michael (Department: 2881)
Radiant energy
Inspection of solids or liquids by charged particles
Electron microscope type
C250S306000, C250S307000, C250S310000
Reexamination Certificate
active
08067732
ABSTRACT:
An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter (5-1), an electromagnetic deflector (11-1), a beam separator (12-1), and a tablet lens (17-1) as an objective lens. The beam separator (12-1) is configured such that a distance by which a secondary electron beam passes through the beam separator is approximately three times longer than a distance by which a primary electron beam passes through the beam separator. Therefore, even if a magnetic field in the beam separator is set to deflect the primary electron beam by a small angle equal to or less than approximately 10 degrees, the secondary electron beam can be deflected by approximately 30 degrees, so that the primary and secondary electron beams are sufficiently separated. Also, since the primary electron beam is deflected by a small angle, less aberration occurs in the primary electron beam. Accordingly, since a light path length of a primary electro-optical system, it is possible to reduce the influence of space charge and the occurrence of deflection aberration.
REFERENCES:
patent: 3472997 (1969-10-01), Fair et al.
patent: 4779046 (1988-10-01), Rouberoi et al.
patent: 4962313 (1990-10-01), Rose
patent: 5084622 (1992-01-01), Rose
patent: 5763898 (1998-06-01), Nakasuji
patent: 5864142 (1999-01-01), Muraki et al.
patent: 6043491 (2000-03-01), Ose et al.
patent: 6111253 (2000-08-01), Tsuno
patent: 6191423 (2001-02-01), Krijn et al.
patent: 6310341 (2001-10-01), Todokoro et al.
patent: 6462474 (2002-10-01), Symons
patent: 6465797 (2002-10-01), Okunuki
patent: 6479819 (2002-11-01), Hamashima et al.
patent: 6509569 (2003-01-01), Frosien
patent: 6563114 (2003-05-01), Nagahama et al.
patent: 6580073 (2003-06-01), Plies et al.
patent: 6608308 (2003-08-01), Takagi et al.
patent: 6635891 (2003-10-01), Nakano et al.
patent: 6661008 (2003-12-01), Takagi et al.
patent: 6770887 (2004-08-01), Krivanek et al.
patent: 6784437 (2004-08-01), Rose
patent: 6844548 (2005-01-01), Lopez et al.
patent: 6855929 (2005-02-01), Kimba et al.
patent: 6924488 (2005-08-01), Matsuya et al.
patent: 6992290 (2006-01-01), Watanabe et al.
patent: 7012262 (2006-03-01), Rose
patent: 7223973 (2007-05-01), Kimba et al.
patent: 7282727 (2007-10-01), Retsky
patent: 7321124 (2008-01-01), Rose
patent: 7351969 (2008-04-01), Watanabe et al.
patent: 7408175 (2008-08-01), Kimba et al.
patent: 7465939 (2008-12-01), Frosien
patent: 7569838 (2009-08-01), Watanabe et al.
patent: 2002/0024013 (2002-02-01), Gerlach et al.
patent: 2002/0148961 (2002-10-01), Nakasuji et al.
patent: 2003/0085353 (2003-05-01), Almogy et al.
patent: 2003/0098415 (2003-05-01), Matsuya et al.
patent: 2003/0122076 (2003-07-01), Matsuya et al.
patent: 2003/0189181 (2003-10-01), Ohta et al.
patent: 2003/0207475 (2003-11-01), Nakasuji et al.
patent: 2004/0108457 (2004-06-01), Kienzle et al.
patent: 2004/0159787 (2004-08-01), Nakasuji et al.
patent: 2004/0188635 (2004-09-01), Kawasaki et al.
patent: 2005/0253066 (2005-11-01), Watanabe et al.
patent: 2006/0169910 (2006-08-01), Frosien et al.
patent: 2007/0228922 (2007-10-01), Nakasuji
patent: 2008/0173814 (2008-07-01), Watanabe et al.
patent: 2008/0308729 (2008-12-01), Kimba et al.
patent: 2008/0315090 (2008-12-01), Nakasuji et al.
patent: 2009/0014649 (2009-01-01), Nakasuji et al.
patent: 2009/0212213 (2009-08-01), Nakasuji et al.
patent: 62-31933 (1987-02-01), None
patent: 9-270241 (1997-10-01), None
patent: 11-67139 (1999-03-01), None
patent: 11-233062 (1999-08-01), None
patent: 11-238484 (1999-08-01), None
patent: 2000-228162 (2000-08-01), None
patent: 2001-148227 (2001-05-01), None
patent: 2001-513254 (2001-08-01), None
patent: 2001-291482 (2001-10-01), None
patent: 2002-367552 (2002-12-01), None
patent: 2003-157785 (2003-05-01), None
patent: 2003-173756 (2003-06-01), None
patent: 2003-187731 (2003-07-01), None
patent: 2003-234078 (2003-08-01), None
patent: 2004-087460 (2004-03-01), None
patent: 2004-165146 (2004-06-01), None
patent: 2004-214044 (2004-07-01), None
patent: 2004-214156 (2004-07-01), None
patent: 2004-235225 (2004-08-01), None
patent: 2004-303547 (2004-10-01), None
patent: 2004-335190 (2004-11-01), None
patent: 2004-342341 (2004-12-01), None
patent: 2005-197121 (2005-07-01), None
patent: 99-33085 (1999-07-01), None
patent: 02/37527 (2002-05-01), None
patent: 2005/024890 (2005-03-01), None
US 6,329,569, 12/2001, Krijn et al. (withdrawn)
Japanese Office Action dated Jul. 12, 2010, issued in corresponding Japanese Patent Application No. 2006-065143.
Ioanoviciu, D. et al.; “Third order aberration theory of double Wien filters”; Review of Scientific Instruments, Nov. 2004, pp. 4434-4441, vol. 75, No. 11.
International Search Report of PCT/JP2006/304088 dated May 30, 2006.
International Search Report of PCT/JP2006/305688 dated Jul. 4, 2006.
Rose, H.; “Inhomogeneous Wien filter as a corrector compensating for the chromatic and spherical aberration of low-voltage electron microscopes.”; Optik, (1990), pp. 91-107, vol. 84, No. 3.
Tsuno, K.; “Negative aberrations generated by a Wien-type multi-pole corrector”; Japan Society for the Promotion of Science, Jul. 29, 2005, pp. 39-46.
Tsuno K. et al.; “Third-order aberration theory of Wien filters for momchromators and aberration correctors”; Journal of Microscopy, Mar. 2005, pp. 205-215, vol. 217, Pt.
International Search Report of PCT/JP2006/314571 dated Oct. 10, 2006.
International Search Report of PCT/JP2006/314571, date of mailing Oct. 10, 2006.
Japanese Office Action dated Dec. 10, 2010, issued in corresponding Japanese Patent Application No. 2006-065143.
Karimata Tsutomi
Kimba Toshifumi
Miyamoto Matsutaro
Mori Satoshi
Murakami Takeshi
Ebara Corporation
Kabushiki Kaisha Toshiba
Maskell Michael
Westerman Hattori Daniels & Adrian LLP
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