Electron beam apparatus

Details Electron beam apparatus Electron beam apparatus

2005-09-26

2009-02-17

Font, Frank G (Department: 2883)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S306000, C250S307000, C250S3960ML, C250S397000, C250S398000, C250S399000, C250S400000

Reexamination Certificate

active

07491933

ABSTRACT:
An electron beam (4) to be irradiated onto a sample (10) is two-dimensionally scanned by a scanning coil (9), and secondary electrons generated from the sample (10) by the scanning are detected by a secondary electron detector (13). A deflection coil (15) for image shifting is used for electrically deflecting the primary electron beam to shift a field of view for image shift in an arbitrary direction by an arbitrary amount. By the image shift, the primary electron beam (4) to be irradiated onto the sample is energy dispersed to degrade the resolution. However, an E×B field producer (30) for dispersion control gives the primary electron beam energy dispersion in the opposite direction and having the equal magnitude. Therefore, the energy dispersion produced in the primary electron beam by the image shift is automatically corrected.

REFERENCES:
patent: 4362945 (1982-12-01), Riecke
patent: 4978855 (1990-12-01), Liebi et al.
patent: 5221844 (1993-06-01), van der Mast et al.
patent: 6084238 (2000-07-01), Todokoro et al.
patent: 6614026 (2003-09-01), Adamec
patent: 2-142045 (1990-05-01), None
patent: 2-242555 (1990-09-01), None
patent: 4-328232 (1992-11-01), None
patent: 6-132002 (1994-05-01), None
patent: 2821153 (1998-08-01), None

Affiliated with

Also associated with

Rating

Electron beam apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4113931