Electron beam apparatus

Details Electron beam apparatus Electron beam apparatus

2007-02-13

2007-02-13

Wells, Nikita (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S311000, C250S306000

Reexamination Certificate

active

10999124

ABSTRACT:
An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample placed on an X-Y-θ stage through an electrostatic lens, an objective lens and the like, secondary electrons or reflected electrons are emitted from the sample. The primary electron beam is incident at an incident angle set at approximately 35° or more by controlling a deflector. Electrons emitted from the sample is guided in the vertical direction, and focused on a detector. The detector is made up of an MCP, a fluorescent plate, a relay lens, and a TDI (or CCD). An electric signal from the TDI is supplied to a personal computer for image processing to generate a two-dimensional image of the sample.

REFERENCES:
patent: 6265719 (2001-07-01), Yamazaki et al.
patent: 6385292 (2002-05-01), Dunham et al.
patent: 6765217 (2004-07-01), Nishimura et al.
patent: 2002/0036264 (2002-03-01), Nakasuji et al.
patent: 2004/0183013 (2004-09-01), Nakasuji et al.
patent: 2005/0121611 (2005-06-01), Kimba et al.
patent: 2005/0194535 (2005-09-01), Noji et al.
patent: 11-283548 (1998-03-01), None

Affiliated with

Also associated with

Rating

Electron beam apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3866451