Electron beam apparatus

Details Electron beam apparatus Electron beam apparatus

2007-06-05

2007-06-05

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S3960ML

Reexamination Certificate

active

10619192

ABSTRACT:
An electron beam apparatus is provided in which a sample is scanned with a plurality of primary electron beams respectively emitted from a plurality of electron guns. Each of the electron guns comprises a mechanism for adjusting a relative position between a cathode and anode. The adjusting mechanism of each of the electron guns comprises an insulator for supporting the cathode and a plurality of piezo elements for supporting the insulator. The piezo element varies its length in response to a voltage applied thereto. Therefore, the position of the cathode is adjustable relative to the anode position, by controlling voltages applied to the piezo elements.

REFERENCES:
patent: 5892224 (1999-04-01), Nakasuji
patent: 6023060 (2000-02-01), Chang et al.
patent: 6411377 (2002-06-01), Noguchi et al.
patent: 6593152 (2003-07-01), Nakasuji et al.
patent: 7049585 (2006-05-01), Nakasuji et al.
Shinada, H. et al. “High Speed and Large-Current Electron Optics for Wafer Inspection”, Proceedings LSI Testing Symposium/2000 Conference Minutes, pp. 151-156.

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