Electron beam apparatus

Details Electron beam apparatus Electron beam apparatus

2011-06-14

2011-06-14

Vanore, David A (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S397000, C250S398000, C250S492100, C250S492220, C250S3960ML

Reexamination Certificate

active

07960697

ABSTRACT:
The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review.The present invent provides solution of improving imaging resolution by utilizing a field emission cathode tip with a large tip radius, applying a large accelerating voltage across ground potential between the cathode and anode, positioning the beam limit aperture before condenser lens, utilizing condenser lens excitation current to optimize image resolution, applying a high tube bias to shorten electron travel time, adopting and modifying SORIL objective lens to ameliorate aberration at large field of view and under electric drifting and reduce the urgency of water cooling objective lens while operating material analysis.The present invent provides solution of improving throughput by utilizing fast scanning ability of SORIL and providing a large voltage difference between sample and detectors.

REFERENCES:
patent: 4068123 (1978-01-01), Kokubo
patent: 4675524 (1987-06-01), Frosien et al.
patent: 4700075 (1987-10-01), Kurz et al.
patent: 4713543 (1987-12-01), Feuerbaum et al.
patent: 4728790 (1988-03-01), Plies
patent: 4808821 (1989-02-01), Feuerbaum et al.
patent: 4818874 (1989-04-01), Ishikawa
patent: 4831266 (1989-05-01), Frosien et al.
patent: 4926054 (1990-05-01), Frosien
patent: 5004918 (1991-04-01), Tsuno
patent: 5198675 (1993-03-01), Hikita et al.
patent: 5498874 (1996-03-01), Miyoshi et al.
patent: 5665968 (1997-09-01), Meisburger et al.
patent: 5717204 (1998-02-01), Meisburger et al.
patent: 5872358 (1999-02-01), Todokoro et al.
patent: 6194729 (2001-02-01), Weimer
patent: 6365896 (2002-04-01), van der Mast
patent: 6380546 (2002-04-01), Petrov et al.
patent: 6392231 (2002-05-01), Chen
patent: 6407387 (2002-06-01), Frosien et al.
patent: 6426501 (2002-07-01), Nakagawa
patent: 6462467 (2002-10-01), Russ
patent: 6463124 (2002-10-01), Weisman et al.
patent: 6545277 (2003-04-01), Kella et al.
patent: 6605805 (2003-08-01), Chen
patent: 6617579 (2003-09-01), Yonezawa
patent: 6642520 (2003-11-01), Kimura et al.
patent: 6768324 (2004-07-01), Yamada et al.
patent: 6775452 (2004-08-01), Howells
patent: 6853143 (2005-02-01), Nakasuji et al.
patent: 6855938 (2005-02-01), Preikszas et al.
patent: 6960766 (2005-11-01), Chen
patent: 6972412 (2005-12-01), Scholtz et al.
patent: 6975125 (2005-12-01), Yamada et al.
patent: 7067807 (2006-06-01), Petrov et al.
patent: 7098468 (2006-08-01), Aloni et al.
patent: 7161667 (2007-01-01), Meeks et al.
patent: 7180317 (2007-02-01), Hollman
patent: 7312449 (2007-12-01), Nakasuji et al.
patent: 7385195 (2008-06-01), Yamada et al.
patent: 7521700 (2009-04-01), Aloni et al.
patent: 7544937 (2009-06-01), Frosien
patent: 7598499 (2009-10-01), Platzgummer
patent: 7612337 (2009-11-01), Suzuki et al.
patent: 7645989 (2010-01-01), Bihr et al.
patent: 7652263 (2010-01-01), Feuerbaum
patent: 7705298 (2010-04-01), Liu et al.
patent: 7705301 (2010-04-01), Tseng et al.
patent: 7759653 (2010-07-01), Chen et al.
patent: 2003/0155509 (2003-08-01), Nakasuji et al.
patent: 2004/0239347 (2004-12-01), Yamada et al.
patent: 2005/0023491 (2005-02-01), Young et al.
patent: 2005/0133733 (2005-06-01), Nakasuji et al.
patent: 2006/0202119 (2006-09-01), Yamada et al.
patent: 2006/0243918 (2006-11-01), Aloni et al.
patent: 2008/0067380 (2008-03-01), Ozawa et al.
patent: 2008/0099693 (2008-05-01), Platzgummer
patent: 2008/0217529 (2008-09-01), Sukegawa et al.
patent: 2008/0315094 (2008-12-01), Wang et al.
patent: 2009/0090866 (2009-04-01), Zhang et al.
patent: 2009/0242792 (2009-10-01), Hosoya et al.
patent: 2009/0294664 (2009-12-01), Chen et al.
patent: 2010/0028235 (2010-02-01), Qin et al.
patent: 2010/0102227 (2010-04-01), Chen et al.
patent: 2010/0118310 (2010-05-01), Matsui
patent: 2010/0150429 (2010-06-01), Jau et al.
patent: 3925949 (1991-02-01), None
Ludwig Reimer, “Image Formation in Low-Voltage Scanning Electron Microscopy”, SPIE Optical Engineering Press, Tutorial Texts vol. TT12, 1993, 16 total pages (pp. 12, 13, 28-41, 88-101).
K. Tsuno, “Aberration Analysis of a Wien Filter for Electrons”, Wissenschaftliche Verlagsgesellschaft mbH Stuugart, vol. 89-No. 1, 1991, pp. 31-40.
Ronnie Porat, et al., “SEM-based methodology for root cause analysis of wafer edge and bevel defects”, IEEE/SEMI Advanced Semiconductor Manufacturing Conference, pp. 11-12, 2008.
Jaime D. Morillo, et al., “Edge and Bevel Automated Defect Inspection for 300mm Production Wafers in Manufacturing”, IEEE/SEMI Advanced Semiconductor Manufacturing Conference, pp. 1-4, 2005.

Affiliated with

Also associated with

Rating

Electron beam apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2679390