Electron and ion beam-shaping apparatus

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250398, 2504922, H01J 37302, H01J 37147

Patent

active

045608784

ABSTRACT:
Electron or ion beam shaping apparatus has first aperture (28) and second aperture (30) through which the beam (20) is focused by first lens (24). Double deflection apparatus of either electromagnetic or electrostatic character is small and can be positioned between the aperture plates so that the image of both apertures can be focused on the target (16). Double deflection serves to vary spot size and shape and assures that target current density does not change while spot size is varied.

REFERENCES:
patent: 4218621 (1980-08-01), Nakasuji et al.
Pfeiffer et al., "Advanced Beam Shaping . . . ", 8th Int. Conf. Electron and Ion Beam Science and Technology, 1978, pp. 149-159.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electron and ion beam-shaping apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron and ion beam-shaping apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron and ion beam-shaping apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1481327

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.