Electron and ion beam-shaping apparatus

Details Electron and ion beam-shaping apparatus Electron and ion beam-shaping apparatus

1983-08-22

1985-12-24

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250398, 2504922, H01J 37302, H01J 37147

Patent

active

045608784

ABSTRACT:
Electron or ion beam shaping apparatus has first aperture (28) and second aperture (30) through which the beam (20) is focused by first lens (24). Double deflection apparatus of either electromagnetic or electrostatic character is small and can be positioned between the aperture plates so that the image of both apertures can be focused on the target (16). Double deflection serves to vary spot size and shape and assures that target current density does not change while spot size is varied.

REFERENCES:
patent: 4218621 (1980-08-01), Nakasuji et al.
Pfeiffer et al., "Advanced Beam Shaping . . . ", 8th Int. Conf. Electron and Ion Beam Science and Technology, 1978, pp. 149-159.

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