Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1998-08-06
2000-09-05
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041921, 427554, 427596, C23C 1434, C23C 1404, C23C 1428
Patent
active
061137510
ABSTRACT:
A method and system for making monolithically integrated thin film photovoltaic is disclosed. In one embodiment of the system, a device for directing electromagnetic energy having a selected frequency is utilized to electronically excite a portion of a second medium on the surface of a substrate to facilitate reaction with an excitable deposition medium. The frequency may be selected such that the desired reaction between the excited second medium and deposition medium is facilitated and side reactions and incorporation of impurities into the thin film are minimized. Multiple layers may be formed by selecting additional frequencies, if necessary. The method of the present invention allows formation of monolithically integrated thin films without removing material from the substrate surface between deposition steps. In one embodiment, the method of the present invention includes the steps of providing a first excitable deposition medium, providing a substrate having a second medium positionable thereon, selecting a frequency of electromagnetic energy to excite the second medium, and directing electromagnetic energy having the selected frequency on at least a portion of the second medium to excite the medium to an excited state to facilitate a reaction with the excitable deposition medium, the product of such reaction being a first thin film deposit on the substrate.
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Cantelmo Gregg
Lockheed Martin Corporation
Nguyen Nam
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