Electrolytic polishing apparatus

Details Electrolytic polishing apparatus Electrolytic polishing apparatus

1997-01-31

1998-12-01

Valentine, Donald R.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204269, 204290F, 204293, C25F 700

Patent

active

058432906

ABSTRACT:
A contactless electrolytic polishing apparatus for manufacturing a lead frame having a smooth polished surface includes a polishing tank containing polishing solution and divided by partitions into a first cathode-containing vessel, a first solution-discharge vessel, a first anode-containing vessel, a second solution-discharge vessel, a second anode-containing vessel, a third solution-discharge vessel and a second cathode-containing vessel. A direct current is applied with ripples having a frequency of 40 to 120 Hz alternately to the anode and cathode in the electrolytic polishing tank filled with an electrolytic polishing solution so that the time for which the blank positioned between both electrodes functions as the anode may be at least 3.3 times longer than that for which it functions as the cathode. The blank is then plated with a metal by employing a customary method.

REFERENCES:
patent: 4326933 (1982-04-01), Sabatka et al.
patent: 4502933 (1985-03-01), Mori et al.
patent: 5181997 (1993-01-01), Kaneko et al.
patent: 5584984 (1996-12-01), Pempera

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