Electroless deposition equipment or apparatus and method of perf

Details Electroless deposition equipment or apparatus and method of perf Electroless deposition equipment or apparatus and method of perf

1996-11-18

1998-11-03

Bowers, Charles L.

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438908, 438913, H01L 2144

Patent

active

058308059

ABSTRACT:
An electroless deposition apparatus and a method of electroless deposition that uses a single process chamber for performing multiple processes by moving through the process chamber a variety of fluids one at a time in a sequential order.

REFERENCES:
patent: 3801368 (1974-04-01), Fusayama et al.
patent: 4894260 (1990-01-01), Kumasaka et al.
patent: 5071518 (1991-12-01), Pan
patent: 5075259 (1991-12-01), Moran
patent: 5171709 (1992-12-01), Donelon et al.
patent: 5308796 (1994-05-01), Feldman et al.
patent: 5424252 (1995-06-01), Morishita

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