Electroformed sputtering target

Details Electroformed sputtering target Electroformed sputtering target

2007-11-20

2007-11-20

McNeil, Jennifer C. (Department: 1775)

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Coating predominantly single metal or alloy substrate of...

C205S114000, C205S118000, C205S170000, C205S261000, C204S484000

Reexamination Certificate

active

10431399

ABSTRACT:
A method of fabricating a sputtering target for sputter depositing material onto a substrate in a sputtering chamber is described. In one embodiment of the method, a preform having a surface is formed and a layer of sputtering material is electroplated onto the surface of the preform to form the target. The method can be applied to form a sputtering target having a non-planar surface.

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