Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1988-11-01
1991-12-03
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430308, 522 86, 522 90, 522149, 524555, G03F 712, G03F 7028
Patent
active
050700006
ABSTRACT:
Disclosed is an electrodeposition coating composition for use in printed circuit board photo resist, comprising (a) an acrylic resin containing (meth)acryloyl group and obtained by use of diacetone (meth)acrylamide as an essential monomer component, said acrylic resin being a water-soluble or water-dispersible photo-curable unsaturated resin having an acid value of 20 to 300, a degree of unsaturation of 0.2 to 4.5 moles/kg, a number average molecular weight of 1,000 to 100,000 and a glass transition temperature of 0.degree. to 100.degree. C., and (b) a water-insoluble photopolymerization initiator.
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Akaki Yuu
Iwasawa Naozumi
Kondo Toshio
Seko Kenji
Berman Susan
Kansai Paint Co. Ltd.
McCamish Marion E.
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