Electrodepositable photoimageable compositions with improved edg

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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Details

430138, 430935, 4302801, 4302851, 4302811, 204478, G03F 7039, G03F 7004

Patent

active

057210888

ABSTRACT:
This invention provides an improved electrodepositable photoimageable resist composition which includes a photosensitive composition and a microgel. The photosensitive composition can be either a negative-acting or a positive-acting photoresist. Moreover, with regard to each of these, the photoresist component can be either cationic or anionic. The microgel includes a plurality of crosslinked organic particles which can form a stable aqueous dispersion. Moreover, the microgel is present in an amount ranging from between about 0.1 to about 30 weight percent. These weight percentages are based upon the total weight of the resin solids in the photoimageable resist composition. At these concentrations, the microgels promote edge coverage, but do not significantly reduce the photosensitivity and developability properties of the photosensitive composition with which they are combined.

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