Electrode unit for in-situ cleaning in thermal CVD apparatus

Details Electrode unit for in-situ cleaning in thermal CVD apparatus Electrode unit for in-situ cleaning in thermal CVD apparatus

1996-09-09

1999-04-13

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723R, 118715, 156345, C23C 1600

Patent

active

058939628

ABSTRACT:
An electrode unit of a thermal CVD apparatus is used to generate plasma discharge for an in-situ cleaning process. The electrode unit is configured by a substrate holder and a shield member connected to a high frequency power supply, the gas supply section electrically grounded, and an auxiliary electrode disposed in the gas supply section. In a film deposition process, a reactive gas is supplied from the gas supply section, and the reactive gas is excited in a space in front of a substrate to deposit a thin film onto the substrate. In a periodical in-situ cleaning process, a cleaning gas is supplied from the gas supply section and a cleaning discharge is generated to remove unwanted films deposited on the substrate holder and the shield member. The auxiliary electrode causes the cleaning discharge to be concentrated in a space around unwanted films.

REFERENCES:
patent: 5006192 (1991-04-01), Deguchi et al.
patent: 5326723 (1994-07-01), Petro et al.
patent: 5651867 (1997-07-01), Kokaku et al.
patent: 5676758 (1997-10-01), Hasegawa et al.
patent: 5693147 (1997-12-01), Ward et al.

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