Electricity: electrical systems and devices – Electrostatic capacitors – Fixed capacitor
Patent
1995-12-26
1998-08-25
Ledynh, Bot L.
Electricity: electrical systems and devices
Electrostatic capacitors
Fixed capacitor
361312, 3613215, 257295, 257306, 257310, H01G 406
Patent
active
057989036
ABSTRACT:
A ferroelectric capacitor structure and its method of making in which a ferroelectric stack of two metal-oxide electrodes sandwiching a ferroelectric layer is fabricated on a silicon substrate with an intervening barrier layer, preferably of TiN. In one embodiment, a platinum layer is grown between the TiN and the lower metal-oxide electrode at a sufficiently high temperature that provides crystallographically ordered growth of the ferroelectric stack. In another embodiment, the platinum layer was completely eliminated with the lower electrode being grown directly on the TiN. Although the conventional conductive metal-oxide used in the electrode is lanthanum strontium cobalt oxide (LSCO), lanthanum nickel oxide provides good electrical and lifetime characteristics in a ferroelectric cell. Alternatively, the electrodes can be formed of the rock-salt metal oxides, such as neodymium oxide (NdO).
REFERENCES:
patent: 5248564 (1993-09-01), Ramesh
patent: 5262920 (1993-11-01), Sakuma et al.
patent: 5293510 (1994-03-01), Takenaka
patent: 5406445 (1995-04-01), Fujii et al.
patent: 5426075 (1995-06-01), Perino et al.
patent: 5479317 (1995-12-01), Ramesh
patent: 5519235 (1996-05-01), Ramesh
patent: 5555486 (1996-09-01), Kingon et al.
patent: 5561307 (1996-10-01), Mihara et al.
Kinney, "Signal magnitudes in high density ferroelectric memories," Integrated Ferroelectrics, vol. 4, 1994, pp. 131-144.
Prasad et al., Structure and ferroelectric properties of Bi.sub.2 VO.sub.5.5 thin films by laser deposition, Proceedings of the Eighth International Meeting on Ferroelectrics, Gaithersburg, Maryland, 1993.
Satyalakshmi et al., "Epitaxial metallic LaNiO.sub.3 thin films grown by pulsed laser deposition," Applied Physics Letters, vol. 62, 1993, pp. 1233-1235.
Tsuda et al., Electronic Conduction in Oxides, (Springer-Verlag, 1991), pp. 13, 14, 30-33, 39, 40.
Dhote Anil M.
Ramesh Ramamoorthy
Bell Communications Research Inc.
Giordano Joseph
Hey David A.
Ledynh Bot L.
University of Maryland
LandOfFree
Electrode structure for ferroelectric capacitor integrated on si does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrode structure for ferroelectric capacitor integrated on si, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrode structure for ferroelectric capacitor integrated on si will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-40298