Electrode structure for ferroelectric capacitor integrated on si

Electricity: electrical systems and devices – Electrostatic capacitors – Fixed capacitor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

361312, 3613215, 257295, 257306, 257310, H01G 406

Patent

active

057989036

ABSTRACT:
A ferroelectric capacitor structure and its method of making in which a ferroelectric stack of two metal-oxide electrodes sandwiching a ferroelectric layer is fabricated on a silicon substrate with an intervening barrier layer, preferably of TiN. In one embodiment, a platinum layer is grown between the TiN and the lower metal-oxide electrode at a sufficiently high temperature that provides crystallographically ordered growth of the ferroelectric stack. In another embodiment, the platinum layer was completely eliminated with the lower electrode being grown directly on the TiN. Although the conventional conductive metal-oxide used in the electrode is lanthanum strontium cobalt oxide (LSCO), lanthanum nickel oxide provides good electrical and lifetime characteristics in a ferroelectric cell. Alternatively, the electrodes can be formed of the rock-salt metal oxides, such as neodymium oxide (NdO).

REFERENCES:
patent: 5248564 (1993-09-01), Ramesh
patent: 5262920 (1993-11-01), Sakuma et al.
patent: 5293510 (1994-03-01), Takenaka
patent: 5406445 (1995-04-01), Fujii et al.
patent: 5426075 (1995-06-01), Perino et al.
patent: 5479317 (1995-12-01), Ramesh
patent: 5519235 (1996-05-01), Ramesh
patent: 5555486 (1996-09-01), Kingon et al.
patent: 5561307 (1996-10-01), Mihara et al.
Kinney, "Signal magnitudes in high density ferroelectric memories," Integrated Ferroelectrics, vol. 4, 1994, pp. 131-144.
Prasad et al., Structure and ferroelectric properties of Bi.sub.2 VO.sub.5.5 thin films by laser deposition, Proceedings of the Eighth International Meeting on Ferroelectrics, Gaithersburg, Maryland, 1993.
Satyalakshmi et al., "Epitaxial metallic LaNiO.sub.3 thin films grown by pulsed laser deposition," Applied Physics Letters, vol. 62, 1993, pp. 1233-1235.
Tsuda et al., Electronic Conduction in Oxides, (Springer-Verlag, 1991), pp. 13, 14, 30-33, 39, 40.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrode structure for ferroelectric capacitor integrated on si does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrode structure for ferroelectric capacitor integrated on si, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrode structure for ferroelectric capacitor integrated on si will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-40298

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.