Electrode position controller for a semiconductor etching device

Details Electrode position controller for a semiconductor etching device Electrode position controller for a semiconductor etching device

1993-03-18

1994-10-11

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156345, 20429832, G01C 500, H01L 2100

Patent

active

053544137

ABSTRACT:
A high precision electrode position controller is provided for use in a semiconductor etching device. The electrode position controller, system, and method of use can accurately and repeatedly position a dry etch electrode within the etch chamber without having to open the chamber and manually move the electrode. Moreover, the actual gap between electrodes can be calibrated each time the etching device is turned on. Frequent calibration of actual electrode position ensures the electrodes are positioned parallel to each other and at an optimal distance therebetween. Accurate positioning of the electrodes provides a more precise etch rate and a more uniform etch across the wafer surface. By repositioning the electrodes and maintaining parallelism, varying types of material can be accurately etched.

REFERENCES:
patent: 3941985 (1976-03-01), Kawase et al.
patent: 4070578 (1978-01-01), Timothy et al.
patent: 4114035 (1978-09-01), Herzog
patent: 4724322 (1988-02-01), Knowles et al.
patent: 5132545 (1992-07-01), Shono et al.
patent: 5225830 (1993-07-01), Andermo et al.

Affiliated with

Also associated with

Rating

Electrode position controller for a semiconductor etching device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrode position controller for a semiconductor etching device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrode position controller for a semiconductor etching device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1656002