Electrode pattern forming method

Details Electrode pattern forming method Electrode pattern forming method

1990-10-01

1993-02-02

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430 20, 430311, 430318, 156643, 1566591, 156660, 2041293, 20412965, 204131, G03F 700

Patent

active

051837250

ABSTRACT:
An electrode pattern forming method comprising the steps of: forming a transparent conductive film on a substrate, covering said transparent conductive film with an aluminum film, forming a resist material film for etching on said aluminum film, exposing said resist material film followed by developing by immersing said substrate in an electrolyte to form a resist pattern, and patterning said aluminum film using said resist pattern as a mask;

REFERENCES:
patent: 4549944 (1985-10-01), Pliefke
patent: 4614570 (1986-09-01), Pliefke

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