Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-08-07
1998-05-12
Beck, Shrive
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
427569, 427571, 427577, 427 78, 427115, 4272556, 4272557, C23C 1626, C23C 1650
Patent
active
057500134
ABSTRACT:
An electrode membrane assembly structure comprises a substrate, two active catalytic layers, each active catalytic layer consisting of micro-particle metal layer(s) and porous conducting layer(s) arranged alternately, and a solid polymer membrane layer being sandwiched in said two active catalytic layers and having protonic conductivity. And a method for manufacturing an electrode membrane assembly comprises the steps of forming an active catalytic layer comprising micro-particle metal layers and porous conducting layers on a substrate by plasma sputtering deposition and chemical vapor deposition (CVD), respectively; then forming a solid polymer membrane layer having protonic conductivity on said active catalytic layer by chemical vapor deposition; and followed by further forming another active catalytic layer on said solid polymer membrane layer, all under the condition of vacuum environment, to obtain the electrode membrane assembly.
REFERENCES:
patent: 5518831 (1996-05-01), Tou et al.
Beck Shrive
Industrial Technology Research Institute
Meeks Timothy H.
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