Electrode member used in a plasma treating apparatus

Details Electrode member used in a plasma treating apparatus Electrode member used in a plasma treating apparatus

2006-11-21

2006-11-21

Hassanzadeh, Parviz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C156S345430

Reexamination Certificate

active

07138034

ABSTRACT:
In a plasma treating apparatus, a ceramic porous substance having a three-dimensional network structure in which a frame portion formed of ceramic containing alumina is provided continuously like a three-dimensional network is used for the material of an electrode member for the plasma treating apparatus to be attached to the front surface of a gas supplying port of an electrode for plasma generation, and a gas for plasma generation is caused to pass through a hole portion formed irregularly in the three-dimensional network structure. Consequently, the distribution of the gas to be supplied is made uniform to prevent an abnormal discharge so that uniform etching having no variation can be carried out.

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Amended claims of U.S. Appl. No. 10/178, 444 dated on Jun. 9, 2005 used for the provisional Double Patenting Rejection.

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