Electrode for use in a plasma assisted chemical etching process

Details Electrode for use in a plasma assisted chemical etching process Electrode for use in a plasma assisted chemical etching process

1994-01-28

1994-12-13

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156657, 156345, H01L 21306, B44C 122

Patent

active

053726740

ABSTRACT:
The electrode (11) of the present invention is used in a Plasma Assisted Chemical Etching process and comprises an inner member (47) surrounded by an outer member (45) defining a gap (77) therebetween such that a gas can flow therethrough. In the preferred embodiment, the inner member (47) and the concentric outer member (45) are both cylindrical in shape, therefore, the gap (77) has an annular configuration. A vertical ducting system is bored within the inner member (47) and directly or indirectly intersects the annular gap (77).

REFERENCES:
patent: 4270999 (1981-06-01), Hassan
patent: 4590042 (1986-05-01), Drage
Rapid, Noncontact Optical Figuring of Aspehric Surfaces With Plasma-Assisted Chemical Etching, D. L. Bollinger, G. M. Gallatin, J. Samuels, G. Steinberg, C. B. Zarowin, Hughes Danbury Optical Systems, Inc., from SPIE vol. 1333 Advanced Optical Manufacturing and Testing (1990), pp. 2-14.

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