Electrode for plasma processes and method for manufacture and us

Details Electrode for plasma processes and method for manufacture and us Electrode for plasma processes and method for manufacture and us

1998-06-30

2000-06-13

Utech, Benjamin

Coating apparatus

Gas or vapor deposition

With treating means

118724, 156345, H01L 2100

Patent

active

060735775

ABSTRACT:
An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically and/or thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

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patent: 5569356 (1996-10-01), Lenz et al.
patent: 5690795 (1997-11-01), Rosenstein et al.
patent: 5744199 (1998-04-01), Joffre et al.

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