Electrochemically fabricated structures having dielectric or...

Electrolysis: processes – compositions used therein – and methods – Electroforming or composition therefor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C205S118000, C205S220000, C205S221000, C205S222000, C205S223000

Reexamination Certificate

active

10434493

ABSTRACT:
Multilayer structures are electrochemically fabricated on a temporary (e.g. conductive) substrate and are thereafter bonded to a permanent (e.g. dielectric, patterned, multi-material, or otherwise functional) substrate and removed from the temporary substrate. In some embodiments, the structures are formed from top layer to bottom layer, such that the bottom layer of the structure becomes adhered to the permanent substrate, while in other embodiments the structures are form from bottom layer to top layer and then a double substrate swap occurs. The permanent substrate may be a solid that is bonded (e.g. by an adhesive) to the layered structure or it may start out as a flowable material that is solidified adjacent to or partially surrounding a portion of the structure with bonding occurs during solidification. The multilayer structure may be released from a sacrificial material prior to attaching the permanent substrate or it may be released after attachment.

REFERENCES:
patent: 3909332 (1975-09-01), Yerman
patent: 4306925 (1981-12-01), Lebow et al.
patent: 5106461 (1992-04-01), Volfson et al.
patent: 5190637 (1993-03-01), Guckel
patent: 5829128 (1998-11-01), Eldridge et al.
patent: 5891285 (1999-04-01), Nakayama
patent: 5917707 (1999-06-01), Khandros et al.
patent: 5989994 (1999-11-01), Khoury et al.
patent: 6002179 (1999-12-01), Chan et al.
patent: 6027630 (2000-02-01), Cohen
patent: 6043563 (2000-03-01), Eldridge et al.
patent: 6166915 (2000-12-01), Lake et al.
patent: 6255126 (2001-07-01), Mathieu et al.
patent: 6268015 (2001-07-01), Mathieu et al.
patent: 6287891 (2001-09-01), Sayyah
patent: 6369464 (2002-04-01), Khoury
patent: 6491968 (2002-12-01), Mathieu et al.
patent: 6572742 (2003-06-01), Cohen
patent: 6586955 (2003-07-01), Fjelstad et al.
patent: 6627980 (2003-09-01), Eldridge
patent: 6672875 (2004-01-01), Mathieu et al.
patent: 6727579 (2004-04-01), Eldridge et al.
patent: 6827584 (2004-12-01), Mathieu et al.
patent: 7047638 (2006-05-01), Eldridge et al.
patent: 2003/0127336 (2003-07-01), Cohen, et al.
patent: 2003/0221968 (2003-12-01), Cohen, et al.
patent: 2003/0222738 (2003-12-01), Brown, et al.
patent: 2003/0234179 (2003-12-01), Bang
patent: 2004/0000489 (2004-01-01), Zhang, et al.
patent: 2004/0004001 (2004-01-01), Cohen, et al.
patent: 2004/0007468 (2004-01-01), Cohen, et al.
patent: 2004/0007470 (2004-01-01), Smalley
patent: 2004/0020782 (2004-02-01), Cohen, et al.
patent: 2004/0065550 (2004-04-01), Zhang
patent: 2004/0065555 (2004-04-01), Zhang
patent: 2004/0144653 (2004-07-01), Jerominek et al.
patent: 2005/0067292 (2005-03-01), Thompson et al.
patent: 792920 (1958-04-01), None
patent: 07-323654 (1995-12-01), None
patent: 09-279365 (1997-10-01), None
Cohen et al., “EFAB: Rapid, low-cost desktop micromachining of high aspect ratio true 3-D MEMS,” 12th IEEE International Conference on Microelectromechanical Systems, pp. 244-251 (Jan. 17-21, 1999).
Cohen et al., “EFAB: Rapid, Low-Cost Desktop Micromachining of High Aspect Ratio True 3-D MEMS”, Proc. 12th IEEE Micro Electro Mechanical Systems Workshop, IEEE, Jan. 1999, pp. 244-251.
Cohen, et al., “EFAB: Batch Production of Functional, Fully-Dense Metal Parts with Micron-Scale Features”, Proc. 9th Solid Freeform Fabrication, the University of Texas at Austin, Aug. 1998, p. 161.
Adam L. Cohen, et al., “EFAB: Rapid, Low-Cost Desktop Micromachining of high Aspect Ratio True 3-D MEMS”, Proc. 12th IEEE Micro Electro Mechanical Systems Workshop, IEEE, Jan. 1999, p. 244.
“Microfabrication - Rapid Prototyping's Killer Application”, Rapid Prototyping Report, CAD/CAM Publishing, Inc. Jun. 1999, pp. 1-5.
Adam L. Cohen, “3-D Micromachining by Electrochemical Fabrication”, Micromachine Devices, Mar. 1999, pp. 6-7.
Gang Zhang, et al., “EFAB: Rapid Desktop Manufacturing of True 3-D Microstructures”, Proc. 2nd International Conference on Integrated MicroNanotechnology for Space Applications, The Aerospace Co., Apr. 1999.
F. Tseng, et al., “EFAB: High Aspect Ratio, Arbitrary 3-D Metal Microstructures Using a Low-Cost Automated Batch Process”, 3rd International Workshop on High Aspect Ration Microstructure Technology (HARMST'99), Jun. 1999.
Adam L. Cohen, et al., “EFAB: Low-Cost, Automated Electrochemical Batch Fabrication of Arbitrary 3-D Microstructures”, Micromachining and Microfabrication Process Technology, SPIE 1999 Symposium on Micromachining and Microfabrication, Sep. 1999.
F. Tseng, et al., “EFAB: High Aspect Ratio, Arbitrary 3-D Metal Microstructures Using a Low-Cost Automated Batch Process”, MEMS Symposium, ASME 1999 International Mechanical Engineering congress and Exposition, Nov. 1999.
Adam L. Cohen, “Electrochemical Fabrication (EFABTM)”, Chapter 19 of the MEMS Handbook, edited by Mohamed Gad-El-Hak, CRC Press, 2002, pp. 19/1-19/23. no month.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrochemically fabricated structures having dielectric or... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrochemically fabricated structures having dielectric or..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrochemically fabricated structures having dielectric or... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3736935

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.