Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1969-07-18
1976-09-21
Tung, T.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204 1T, G01n 2746
Patent
active
039817857
ABSTRACT:
An electrochemical device is designed to respond to a constituent such as oxygen in a reactive mixture which may include a fuel such as methane. The device includes an electrochemical cell employing an electrolye such as a stabilized zirconia associated with two electrodes and designed for operation at an elevated temperature such as 200.degree.C to 1000.degree.C. An electrode for such a cell is designed to have no catalytic action on the mixture.
The system may be arrnaged to assure a full reaction of the mixture before the cell responds to the desired constituent. Thus the mixture may also be subjected to the action of a catalyst before it reaches the electrode area. If the mixture is applied to another non-catalytic cell before it is subjected to the catalyst further information is obtained concerning the desired constitent. The amount of a constituent such as oxygen present before and after the mixture is catalyzed may be compared to provide an indication of the amount of another constituent of the mixture such as methane.
REFERENCES:
patent: 3216911 (1965-11-01), Kronenberg
patent: 3347767 (1967-10-01), Hickam
patent: 3400054 (1968-09-01), Ruka et al.
patent: 3481855 (1969-12-01), Kolodney et al.
patent: 3514377 (1970-05-01), Spacil et al.
patent: 3597345 (1971-08-01), Hickam et al.
Lynch M. P.
Tung T.
Westinghouse Electric Corporation
LandOfFree
Electrochemical sensor for reactive gas mixtures does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrochemical sensor for reactive gas mixtures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrochemical sensor for reactive gas mixtures will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1412130