Chemistry: electrical and wave energy – Apparatus – Electrolytic
Reexamination Certificate
2007-07-24
2007-07-24
King, Roy (Department: 1742)
Chemistry: electrical and wave energy
Apparatus
Electrolytic
C204S242000, C204S263000, C204S275100, C204S282000, C204S295000, C204S297010
Reexamination Certificate
active
10268284
ABSTRACT:
Embodiments of the invention may generally provide a small volume electrochemical plating cell. The plating cell generally includes a fluid basin configured to contain a plating solution therein, the fluid basin having a substantially horizontal weir. The cell further includes an anode positioned in a lower portion of the fluid basin, the anode having a plurality of parallel channels formed therethrough, and a base member configured to receive the anode, the base member having a plurality of groves formed into an anode receiving surface, each of the plurality of grooves terminating into an annular drain channel. A membrane support assembly configured to position a membrane immediately above the anode in a substantially planar orientation with respect to the anode surface is provided, the membrane support assembly having a plurality of channels and bores formed therein.
REFERENCES:
patent: 4296672 (1981-10-01), Inhofer
patent: 4469564 (1984-09-01), Okinaka et al.
patent: 4632851 (1986-12-01), Broadbent et al.
patent: 4840820 (1989-06-01), Schultz et al.
patent: 5071591 (1991-12-01), Sheridan
patent: 5162079 (1992-11-01), Brown
patent: 5224504 (1993-07-01), Thompson et al.
patent: 5252196 (1993-10-01), Sonnenberg et al.
patent: 5287237 (1994-02-01), Kitada et al.
patent: 5435903 (1995-07-01), Oda et al.
patent: 5482680 (1996-01-01), Wilkinson et al.
patent: 5486264 (1996-01-01), Ghandour
patent: 5489341 (1996-02-01), Bergman et al.
patent: 5516418 (1996-05-01), Doss et al.
patent: 5573023 (1996-11-01), Thompson et al.
patent: 5597460 (1997-01-01), Reynolds
patent: 5620581 (1997-04-01), Ang
patent: 5643456 (1997-07-01), Smith et al.
patent: 5656386 (1997-08-01), Scherer et al.
patent: 5705050 (1998-01-01), Sampson et al.
patent: 5714521 (1998-02-01), Kedem et al.
patent: 5731678 (1998-03-01), Zila et al.
patent: 5744019 (1998-04-01), Ang
patent: 5785833 (1998-07-01), Vaughan
patent: 5837120 (1998-11-01), Forand et al.
patent: 5883762 (1999-03-01), Calhoun et al.
patent: 5984341 (1999-11-01), Kass et al.
patent: 5996241 (1999-12-01), Thompson et al.
patent: 6014817 (2000-01-01), Thompson et al.
patent: 6024856 (2000-02-01), Haydu et al.
patent: 6080291 (2000-06-01), Woodruff et al.
patent: 6090260 (2000-07-01), Inoue et al.
patent: 6099702 (2000-08-01), Reid et al.
patent: 6099711 (2000-08-01), Dahms
patent: 6099712 (2000-08-01), Ritzdorf et al.
patent: 6113771 (2000-09-01), Landau
patent: 6126798 (2000-10-01), Reid et al.
patent: 6132857 (2000-10-01), Champenois et al.
patent: 6136163 (2000-10-01), Cheung et al.
patent: 6156167 (2000-12-01), Patton et al.
patent: 6167893 (2001-01-01), Taatjes et al.
patent: 6179983 (2001-01-01), Reid et al.
patent: 6197181 (2001-03-01), Chen
patent: 6197182 (2001-03-01), Kaufman et al.
patent: 6228231 (2001-05-01), Uzoh
patent: 6228232 (2001-05-01), Woodruff et al.
patent: 6248222 (2001-06-01), Wang
patent: 6251251 (2001-06-01), Uzoh et al.
patent: 6254742 (2001-07-01), Hanson et al.
patent: 6258223 (2001-07-01), Cheung et al.
patent: 6261433 (2001-07-01), Landau
patent: 6267853 (2001-07-01), Dordi et al.
patent: 6270635 (2001-08-01), Woo
patent: 6273110 (2001-08-01), Davis et al.
patent: 6280291 (2001-08-01), Gromko et al.
patent: 6280582 (2001-08-01), Woodruff et al.
patent: 6290833 (2001-09-01), Chen
patent: 6309981 (2001-10-01), Mayer et al.
patent: 6319387 (2001-11-01), Krishnamoorthy et al.
patent: 6322674 (2001-11-01), Berner et al.
patent: 6322678 (2001-11-01), Woodruff et al.
patent: 6334937 (2002-01-01), Batz, Jr. et al.
patent: 6347837 (2002-02-01), Watson et al.
patent: 6368475 (2002-04-01), Hanson et al.
patent: 6374837 (2002-04-01), Scranton et al.
patent: 6379522 (2002-04-01), Landau
patent: 6383352 (2002-05-01), Shyu et al.
patent: 6391166 (2002-05-01), Wang
patent: 6395101 (2002-05-01), Scranton et al.
patent: 6395152 (2002-05-01), Wang
patent: 6409892 (2002-06-01), Woodruff et al.
patent: 6415804 (2002-07-01), Pascal et al.
patent: 6423642 (2002-07-01), Peace et al.
patent: 6432293 (2002-08-01), Ogata et al.
patent: 6432821 (2002-08-01), Dubin et al.
patent: 6436249 (2002-08-01), Patton et al.
patent: 6440295 (2002-08-01), Wang
patent: 6503375 (2003-01-01), Maydan et al.
patent: 6518184 (2003-02-01), Chambers et al.
patent: 6521102 (2003-02-01), Dordi
patent: 6527920 (2003-03-01), Mayer et al.
patent: 6551479 (2003-04-01), Graham et al.
patent: 6551487 (2003-04-01), Reid et al.
patent: 6569299 (2003-05-01), Reid et al.
patent: 6576110 (2003-06-01), Maydan
patent: 6586342 (2003-07-01), Mayer et al.
patent: 6589401 (2003-07-01), Patton et al.
patent: 6589874 (2003-07-01), Andricacos et al.
patent: 6592736 (2003-07-01), Fulton et al.
patent: 6736952 (2004-05-01), Emesh et al.
patent: 6740221 (2004-05-01), Cheung et al.
patent: 6773571 (2004-08-01), Mayer et al.
patent: 6790773 (2004-09-01), Drewery et al.
patent: 6800187 (2004-10-01), Reid et al.
patent: 6884335 (2005-04-01), Webb et al.
patent: 6964792 (2005-11-01), Mayer et al.
patent: 2001/0000396 (2001-04-01), Dordi et al.
patent: 2001/0015321 (2001-08-01), Reid
patent: 2001/0032788 (2001-10-01), Woodruff et al.
patent: 2001/0052465 (2001-12-01), Dordi et al.
patent: 2002/0033340 (2002-03-01), Cheung et al.
patent: 2002/0063097 (2002-05-01), Fukunaga et al.
patent: 2002/0074233 (2002-06-01), Ritzdorf et al.
patent: 2002/0096508 (2002-07-01), Weaver et al.
patent: 2003/0000850 (2003-01-01), Horkins
patent: 2003/0010640 (2003-01-01), Kholodenko
patent: 2003/0029726 (2003-02-01), Kovarsky et al.
patent: 2003/0057098 (2003-03-01), Sendai
patent: 2003/0070695 (2003-04-01), Emami et al.
patent: 2003/0085133 (2003-05-01), Totsuka et al.
patent: 2003/0116445 (2003-06-01), Sun et al.
patent: 2003/0159937 (2003-08-01), Gandikota et al.
patent: 2004/0016636 (2004-01-01), Yang et al.
patent: 2004/0016637 (2004-01-01), Yang et al.
patent: 2004/0016647 (2004-01-01), Yang et al.
patent: 2004/0074761 (2004-04-01), Herchen et al.
patent: 2004/0074762 (2004-04-01), Kelgler et al.
patent: 2004/0118694 (2004-06-01), Yang et al.
patent: 2004/0134775 (2004-07-01), Yang et al.
patent: 2004/0149573 (2004-08-01), Herchen
patent: 2004/0192066 (2004-09-01), Lubomirsky et al.
patent: 2004/0195110 (2004-10-01), Srinivasan et al.
patent: 2004/0200725 (2004-10-01), Yahalom et al.
patent: 2004/0206628 (2004-10-01), Lubomirsky et al.
patent: 2004/0217005 (2004-11-01), Yang et al.
patent: 7 14811 (1995-01-01), None
patent: 9 293658 (1997-11-01), None
patent: 10 177988 (1998-06-01), None
patent: 10 242110 (1998-09-01), None
patent: 11 162905 (1999-06-01), None
patent: 11 186210 (1999-07-01), None
patent: WO 02/059398 (2002-08-01), None
patent: WO-98/27585 (1998-06-01), None
patent: WO 00/32835 (2000-06-01), None
patent: WO 00/77278 (2000-12-01), None
patent: WO 01/96632 (2001-12-01), None
patent: WO 2004/003410 (2004-01-01), None
patent: WO 2005/007933 (2005-01-01), None
PCT International Search Report for PCT/US03/23356 dated Jul. 24, 2003.
Colombo; “Wafer Back Surface Film Removal,” Central R&D, SGS-Thomson Microelectronics, Agate Italy.
Pitney, “Ney Contact Manual” Oct. 1974.
Semitool Product Catalog (on-line) Oct. 27, 1998.
Singer, “Copper Has Enormous Benefits When Compared to Aluminum, but its Implementation Requires Some Fundamental Changes in Process Technologies,” Semiconductor International Jun. 1998.
Singer, “Wafer Processing,” Semiconductor International Jun. 1998.
PCT International Search Report from International Application No. PCT/US 2004/022183, dated Oct. 15, 2004.
International Search Report dated Aug. 22, 2005 regarding International Application No. PCT/US2005/016123.
PCT Notification Concerning Transmittal of Copy of International Preliminary Report on Patentability dated Jan. 19, 2006 for PCT/US04/022183.
PCT Written Opinion of the International Searching Authority dated Jan. 19, 2006 for PCT/US04/022183.
Taiwan Office Action dated Oct. 31, 2006 for application No. 94115101.
PCT International Search Report and the Written Opinion for International Application No. PCT/US04/12012 dated Sep. 5, 2006.
Dordi Yezdi
Kovarsky Nicolay
Lubomirsky Dmitry
Singh Saravjeet
Tulshibagwale Sheshraj
Applied Materials Inc.
King Roy
Patterson & Sheridan, LLP.
Zheng Lois
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