Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2004-07-28
2009-10-20
Cantelmo, Gregg (Department: 1795)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192150, C204S298130, C204S298160, C359S273000, C359S321000
Reexamination Certificate
active
07604717
ABSTRACT:
The invention relates to an essentially metallic target of a cathodic sputtering device, in particular a magnetic-field-assisted device, the said target mainly comprising nickel alloyed with at least one other minor element in order to reduce or eliminate its ferromagnetism. The invention also relates to the use of the target to manufacture an electrochromic material with anodic colourization as a thin layer based on alloyed nickel oxide.
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Béteille Fabien
Giron Jean-Christophe
Vermeersch Marc
Cantelmo Gregg
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Saint-Gobain Glass France
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