Electrochemical deoxygenation for liquid phase epitaxial growth

Details Electrochemical deoxygenation for liquid phase epitaxial growth Electrochemical deoxygenation for liquid phase epitaxial growth

1981-03-23

1983-06-21

Bernstein, Hiram H.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156DIG83, C30B 1900

Patent

active

043892744

ABSTRACT:
A method for removing residual oxygen from a growth solution prior to liq phase epitaxial crystal growth comprising the steps of disposing the materials in a containment vessel of a solid oxide electrolyte material under a protective atmosphere, heating the materials to form a liquid charge in the containment vessel, placing an electrode of an inert conducting solid in physical contact with the liquid charge, and applying a DC electric potential between the electrode and the containment vessel, the electrical contact to the containment vessel being made through a porous metallic coating of an inert metal on the outside surface of the containment vessel in the region where the liquid charge is contiguous to the inside surface of the containment vessel, the porous coating being relatively positive and the electrode being relatively negative.

REFERENCES:
patent: 2842467 (1958-07-01), Landauer et al.
patent: 3878073 (1975-04-01), Boorstein et al.
patent: 3899304 (1975-08-01), Linares
patent: 4186045 (1980-01-01), Gatos et al.

Affiliated with

Also associated with

Rating

Electrochemical deoxygenation for liquid phase epitaxial growth does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrochemical deoxygenation for liquid phase epitaxial growth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrochemical deoxygenation for liquid phase epitaxial growth will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2109511