Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1994-09-26
1996-01-09
Monin, Donald L.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257322, 257329, 257334, 257401, H01L 2968, H01L 21265
Patent
active
054830940
ABSTRACT:
An electrically programmable read-only memory cell includes a single crystal silicon pillar having the active region of the memory cell. A memory array of the cells may be configured to act as an EPROM array, an EEPROM array, or a flash EEPROM array. A silicon spacer lies adjacent to each of the silicon pillars and acts as a floating gate for its particular memory cell. A memory cell may have a cell area that is less than one square micron. In an EPROM or a flash EEPROM array, no field isolation is required between the memory cells within the array. Processes for forming the memory cells and the memory array are disclosed.
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Takato, et al; "Impact of Surrounding Gate Transistor (SGT) for Ultra-High-Density LSI's"; IEEE Transactions On Electron Devices; vol. 38, No. 3, pp. 573-577 (1991).
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Kawasaki Hisao
Sharma Umesh
Meyer George R.
Monin Donald L.
Motorola Inc.
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