Electrically-programmable non-volatile memory cell

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S316000, C257S322000, C257S324000, C257S325000, C257S326000, C438S201000, C438S211000, C438S216000, C438S257000, C438S261000, C438S266000

Reexamination Certificate

active

06882001

ABSTRACT:
An electrically-programmable memory cell programmed by means of injection of channel hot electrons into a charge-storage element capacitively coupled to a memory cell channel for modulating a conductivity thereof depending on a stored amount of charge. A first and a second spaced-apart electrode regions are formed in a semiconductor layer and define a channel region there between; at least one of the first and second electrode regions acts as a programming electrode of the memory cell. A control electrode is capacitively coupled to the charge-storage element. The charge-storage element is placed over the channel to substantially extend from the first to the second electrode regions, and is separated from the channel region by a dielectric layer. The dielectric layer has a reduced thickness in a portion thereof near the at least one programming electrode.

REFERENCES:
patent: 4586065 (1986-04-01), Neukomm
patent: 5604366 (1997-02-01), Lee
patent: 5739568 (1998-04-01), Kojima
patent: 5828099 (1998-10-01), Van Dort et al.
patent: 5844271 (1998-12-01), Sethi et al.
patent: 5889700 (1999-03-01), Bergemont et al.
patent: 5894162 (1999-04-01), Paterson et al.
patent: 6078075 (2000-06-01), Widdershoven
patent: 6242773 (2001-06-01), Thomas
patent: 6243300 (2001-06-01), Sunkavalli
patent: 6734491 (2004-05-01), Mitros et al.
patent: 0 778581 (1997-06-01), None
European Search Report for EP 02 42 5085, Aug. 6, 2002.

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