Stock material or miscellaneous articles – Structurally defined web or sheet – Continuous and nonuniform or irregular surface on layer or...
Reexamination Certificate
2000-01-06
2002-08-20
Kiliman, Leszek (Department: 1773)
Stock material or miscellaneous articles
Structurally defined web or sheet
Continuous and nonuniform or irregular surface on layer or...
C428S414000, C428S413000, C428S416000, C264S272150, C264S272170, C204S258000, C204S258000, C204S258000, C156S330000, C118S733000
Reexamination Certificate
active
06436509
ABSTRACT:
CROSS-REFERENCE TO RELATED PATENT APPLICATION
This patent application is a continuation-in-part of U.S. patent application Ser. No. 08/268,480, filed Jun. 30, 1994, and entitled “An Electrically Insulating Sealing Structure And Its Method Of Use In A High Vacuum Physical Vapor Deposition Apparatus”.
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention pertains to an electrically insulating sealing structure which can be used in semiconductor processing such as physical vapor deposition (sputtering). The electrically insulating sealing structure is particularly useful in processing apparatus requiring operation at a vacuum of at least 10
−6
Torr and continuous use at temperatures ranging from about −10° F. (−23.2° C.) to about 750° F. (400° C.).
2. Description of the Background Art
Sputtering describes a number of physical techniques (such as DC plasma enhanced sputtering, RF plasma, and ion gun) commonly used in the semiconductor industry for the deposition of thin films of various metals such as aluminum, aluminum alloys, refractory metal silicides, gold, copper, titanium-tungsten, tungsten, molybdenum, tantalum and, less commonly, silicon dioxide and silicon onto an item (a substrate). In general, the techniques involve producing a gas plasma of ionized inert gas “particles” (atoms or molecules) by using an electrical field in an evacuated chamber. The ionized particles are then directed toward a “target” and collide with it. As a result of the collisions, free atoms or groups of ionized atoms of the target material are ejected from the surface of the target, essentially converting the target material to the free atoms or molecules. The free atoms escaping the target surface are directed toward the substrate and form (deposit) a thin film on the surface of the substrate.
A typical plasma sputtering process uses a magnetic field to concentrate the plasma ions performing the sputtering action in the region of the magnetic field so that target sputtering occurs at a higher rate and at a lower process pressure. In DC sputtering, the target itself is electrically biased with respect to the substrate on which the sputtered material is to be deposited and with respect to the sputter processing chamber. The sputtering target functions as a cathode, with the substrate (depending on the composition of the substrate), the platform on which the substrate sits, and/or the process chamber functioning as an anode. A high voltage, typically between about 200 and 800 volts, is applied between these two electrodes, with the substrate disposed upon a platform positioned opposite the cathode. The pressure in the sputter processing chamber is typically reduced to about 10
−6
to 10
−9
Torr, after which argon, for example, is introduced to produce an argon partial pressure ranging between about 10
−2
to about 10
−4
Torr. Considerable energy is used in generating the gas plasma and creating ion streams impacting on the cathode, and it is not unusual for the temperature of the internal walls, in particular the dark space shield inside the sputter processing chamber, to rise above 750° F. (400° C.).
Recent developments in liquid crystal flat panel display technology have resulted in an interest in processing apparatus capable of carrying out sputtering on a particularly large scale. For example, rectangular flat panels approximately 15 in. by 19 in. (0.38 m×0.48 m) are not uncommon, with the industry moving toward 48 in. by 48 in. (1.2 m×1.2 m) panels. To achieve acceptable display performance over such a large surface area, it is necessary that the conductivity of the metallized electrodes in the underlying semiconductor device, which controls operation of the liquid crystal composition, be especially high. To achieve this high conductivity, technologists would like to use aluminum for the metallized electrodes; however, aluminum oxides form very rapidly in the presence of oxygen, contaminating the deposited aluminum layer and reducing its conductivity. To be able to sputter deposit a low stress film of pure layer of aluminum having the desired conductivity, it is necessary to carry out the sputtering operation at a particularly high vacuum. This reduces the partial pressure of residual ambient air components such as oxygen and water vapor which lead to oxidation of the depositing aluminum. For example, in a sputtering process chamber evacuated to 10
−6
Torr, residual oxygen in the sputtering chamber will deposit a monolayer of oxygen upon an aluminum substrate surface within approximately one second; however, at 10
−9
Torr, it takes about 1,000 seconds to deposit a monolayer of oxygen upon the substrate. This makes it desirable to deposit the conductive aluminum layer in process chambers for which the base pressure is less than 10
−6
Torr, and preferably at 10
−8
to 10
−9
Torr, to obtain a satisfactory conductivity of a low-stress deposited aluminum layer.
FIG. 1
shows an exploded view of a sputtering process apparatus
100
of the kind used to produce flat panel display semiconductor devices. The sputtering process chamber
138
is accessed through a slit-valve opening
145
such that a substrate to be deposited upon (not shown) is delivered to a sputtering pedestal
146
. The insulating structure used to insulate target assembly
124
(the cathode) from process chamber
138
(the anode) includes an outer insulator
134
and a main insulator
133
. Target assembly
124
is further insulated from chamber cap
113
using upper insulator
117
. Power is applied via power connection
155
which progresses through the apparatus through power connection hole
92
. Vacuum passage
156
provides evacuation capability for the chamber cap
113
, and a cooling manifold (not shown) included as a part of target assembly
124
, provides cooling for the sputtering target. A more detailed description of this sputtering process chamber and its functioning is available in patent application Ser. No. 08/236,715 of Richard E. Demaray et al., filed Apr. 29, 1994 now U.S. Pat. No. 5,487,822, and commonly owned by the assignee of this application, which copending patent application is hereby incorporated by reference in its entirety.
Typically upper insulator
117
and outer insulator
134
are constructed from a plastic material such as, for example, acrylic or polycarbonate, as these insulators are not exposed to the high temperatures experienced by main insulator
133
and are subjected to less severe vacuum sealing requirements than main insulator
133
. In the past, the main insulator
133
has been constructed from a ceramic material, for example 99.7% pure aluminum oxide (alumina) or quartz, to provide the dielectric properties required at operating conditions. Typical operating conditions expose the ceramic material to voltages as high as 1,000 volts, at temperatures which may be as high as about 750° F. (400° C.) and which are frequently as high as about 400° F. (204.4° C.). Further, main insulator
133
must also be able to sustain high compressive loads (several tons) and to make a vacuum seal with a process chamber base pressure preferably in the range of 10
−8
to 10
−9
Torr. Thus, the material of construction of the main insulator must meet stringent requirements.
FIG. 2A
shows a cross sectional view of an assembled sputtering process chamber of the kind shown in FIG.
1
. Particular detail definition in the area of main insulator
133
is shown in FIG.
2
B. The target assembly
124
has a target backing plate
128
and O-ring groove
129
which is fitted with an elastomeric O-ring (not shown), typically Viton® (fluorocarbon, trademark of Du Pont Co., Wilmington, Del.), which seals against both target backing plate
128
and ceramic main insulator
133
. Ceramic main insulator
133
is further sealed against sputtering chamber
138
via an O-ring groove
139
in the top flange of sputtering chamber
138
, which also contains an elastomeric O-ring (not shown) constructed from
Demaray Richard Ernest
Deshpandey Chandra
Eline David F.
Herrera Manuel J.
Applied Materials Inc.
Church Shirley L.
Kiliman Leszek
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