Electrically conductive sample support-mounting for secondary io

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports

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250309, 250251, G01N 2100, G01N 2300

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active

044659350

ABSTRACT:
An electrically conductive sample support mounting for the analysis technique of secondary ion mass spectrometry employs a sample plate accommodating the sample. At the sample plate surface facing an ion beam or neutral particle beam, the sample is arranged in an environment-free fashion fully in the interior of the region impinged or scanned by the ion beam or neutral particle beam. Through the creation of a so-called orifice, interfering influences which can arise from a crater rim and from its surroundings are entirely eliminated. The invention is applied in the case of depth profile measurement of ion-implanted doping materials in semiconductor crystal disks and for the purpose of ultrasensitive trace analysis in solids.

REFERENCES:
patent: 3086112 (1963-04-01), Riecke
patent: 4097738 (1978-06-01), Feve et al.
patent: 4310759 (1982-01-01), Oechsner
patent: 4310764 (1982-01-01), Iijima
"Raster Scanning Depth Profiling of Layer Structures", Applied Physics 12, pp. 149-156 (1977).
"Dynamic Range 10.sup.6 in Depth Profiling Using Secondary-Ion Mass Spectrometry", Applied Physics Letters 37 (3), pp. 285-287 (Aug. 1, 1980).

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