Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-02-02
1992-08-11
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430296, 430311, 522112, 522118, 522119, 522127, 522142, 522146, 526256, G03C 173
Patent
active
051377993
ABSTRACT:
An electrically conductive resist material is disclosed, comprising at least one polymer which is sensitive to ionizing radiation and a soluble electrically conductive oligomer or polymer. A process for producing the resist material is also described, comprising admixing an electrically conductive oligomer or polymer dissolved in a solvent to at least one polymer which is sensitive to ionizing radiation. The resist material is useful in preparing electron beam resists which prevent electrostatic charging and resultant electrostatic fields.
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Feldhues Michael
Kaempf Guenther
Lingnau Juergen
Scheunemann Ude
Hoechst Aktiengesellschaft
McCamish Marion E.
Rodee Christopher D.
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